Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17139748Application Date: 2020-12-31
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Publication No.: US11552193B2Publication Date: 2023-01-10
- Inventor: Weize Chen , Mark Griswold , Jaroslav Pjencak
- Applicant: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Applicant Address: US AZ Phoenix
- Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee: SEMICONDUCTOR COMPONENTS INDUSTRIES, LLC
- Current Assignee Address: US AZ Phoenix
- Agent Robert F. Hightower
- Main IPC: H01L29/78
- IPC: H01L29/78 ; H01L29/66 ; H01L29/06

Abstract:
An embodiment of a semiconductor device may include a transistor having a first doped region and a second doped region that extend laterally underlying the source, body, and drain of the transistor. The transistor may have an embodiment that includes an additional bias contact to apply a bias potential to the first doped region and or alternately the second doped region.
Public/Granted literature
- US20220209008A1 SEMICONDUCTOR DEVICE AND METHOD THEREFOR Public/Granted day:2022-06-30
Information query
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