Invention Grant
- Patent Title: Piezoelectric MEMS diaphragm microphone
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Application No.: US16890858Application Date: 2020-06-02
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Publication No.: US11553280B2Publication Date: 2023-01-10
- Inventor: Yu Hui , Kwang Jae Shin
- Applicant: Skyworks Global Pte. Ltd.
- Applicant Address: SG Singapore
- Assignee: Skyworks Global Pte. Ltd.
- Current Assignee: Skyworks Global Pte. Ltd.
- Current Assignee Address: SG Singapore
- Agency: Knobbe, Martens, Olson & Bear, LLP
- Main IPC: H04R17/00
- IPC: H04R17/00 ; H04R17/02 ; B81B3/00 ; H04R1/04 ; H04R7/10 ; H04R19/04

Abstract:
A piezoelectric microelectromechanical systems diaphragm microphone can be mounted on a printed circuit board. The microphone can include a substrate with an opening between a bottom end of the substrate and a top end of the substrate. The microphone can have two or more piezoelectric film layers disposed over the top end of the substrate and defining a diaphragm structure. Each of the two or more piezoelectric film layers can have a predefined residual stress that substantially cancel each other out so that the diaphragm structure is substantially flat with substantially zero residual stress. The microphone can include one or more electrodes disposed over the diaphragm structure. The diaphragm structure is configured to deflect when the diaphragm is subjected to sound pressure via the opening in the substrate.
Public/Granted literature
- US20210021936A1 PIEZOELECTRIC MEMS DIAPHRAGM MICROPHONE Public/Granted day:2021-01-21
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