Invention Grant
- Patent Title: Collecting and recycling rare gases in semiconductor processing equipment
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Application No.: US16814319Application Date: 2020-03-10
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Publication No.: US11557462B2Publication Date: 2023-01-17
- Inventor: Chao Chang , Michael Friedmann
- Applicant: KLA CORPORATION
- Applicant Address: US CA Milpitas
- Assignee: KLA CORPORATION
- Current Assignee: KLA CORPORATION
- Current Assignee Address: US CA Milpitas
- Agency: Hodgson Russ LLP
- Main IPC: H01J37/32
- IPC: H01J37/32 ; B01D53/04 ; B01D53/047 ; B01D53/22

Abstract:
A process chamber, such as for semiconductor processing equipment, is connected with a recovery unit. The recovery unit includes a first storage tank for buffer gas and a second storage tank for rare gas. Both storage tanks are connected with a column in the recovery unit. The recovery unit and process chamber can operate as a closed system. The rare gas can be transported at a variable flow rate while separation in the recovery unit operates at a constant flow condition.
Public/Granted literature
- US20200294774A1 COLLECTING AND RECYCLING RARE GASES IN SEMICONDUCTOR PROCESSING EQUIPMENT Public/Granted day:2020-09-17
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