Invention Grant
- Patent Title: Gas analyzer apparatus
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Application No.: US17417581Application Date: 2020-03-24
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Publication No.: US11557469B2Publication Date: 2023-01-17
- Inventor: Naoki Takahashi , Prakash Sreedhar Murthy
- Applicant: ATONARP INC.
- Applicant Address: JP Tokyo
- Assignee: ATONARP INC.
- Current Assignee: ATONARP INC.
- Current Assignee Address: JP Tokyo
- Agency: Buchanan Ingersoll & Rooney PC
- Priority: JPJP2019-057148 20190325
- International Application: PCT/JP2020/012839 WO 20200324
- International Announcement: WO2020/196452 WO 20201001
- Main IPC: H01J37/32
- IPC: H01J37/32 ; H01J49/10

Abstract:
There is provided a gas analyzer apparatus including: a sample chamber which is equipped with a dielectric wall structure and into which only sample gas to be measured is introduced; a plasma generation mechanism that generates plasma inside the sample chamber, which has been depressurized, using an electric field and/or a magnetic field applied through the dielectric wall structure; and an analyzer unit that analyzes the sample gas via the generated plasma. By doing so, it is possible to provide a gas analyzer apparatus capable of accurately analyzing sample gases, even those including corrosive gas, over a long period of time.
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