Invention Grant
- Patent Title: Substrate support and inspection apparatus
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Application No.: US17356939Application Date: 2021-06-24
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Publication No.: US11557494B2Publication Date: 2023-01-17
- Inventor: Masahito Kobayashi , Hiroyuki Nakayama , Dai Kobayashi
- Applicant: TOKYO ELECTRON LIMITED
- Applicant Address: JP Tokyo
- Assignee: TOKYO ELECTRON LIMITED
- Current Assignee: TOKYO ELECTRON LIMITED
- Current Assignee Address: JP Tokyo
- Agency: Fenwick & West LLP
- Priority: JPJP2020-110831 20200626
- Main IPC: H01L21/67
- IPC: H01L21/67 ; G01R31/28 ; G01R31/26 ; H01L21/683

Abstract:
A substrate support includes a supporting unit and a light irradiation mechanism. The supporting unit includes a plate member on which an inspection target is placed and a transparent member. The light irradiation mechanism is configured to irradiate light to increase a temperature of the inspection target. Each of the plate member and the transparent member is made of a low thermal expansion material having a linear expansion coefficient of 1.0×10−6/K or less.
Public/Granted literature
- US20210407829A1 SUBSTRATE SUPPORT AND INSPECTION APPARATUS Public/Granted day:2021-12-30
Information query
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