Invention Grant
- Patent Title: Via cleaning to reduce resistance
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Application No.: US16667156Application Date: 2019-10-29
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Publication No.: US11557507B2Publication Date: 2023-01-17
- Inventor: Yann A. M. Mignot , Chih-Chao Yang
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Ryan, Mason & Lewis, LLP
- Agent L. Jeffrey Kelly
- Main IPC: H01L21/02
- IPC: H01L21/02 ; H01L21/768 ; H01L23/522 ; H01L23/532

Abstract:
A semiconductor structure includes a multilayer structure having a first layer and a second layer disposed on the first layer. The semiconductor structure further includes at least a first via extending from a top of the second layer to a top of a first metal contact disposed in the first layer. A polymer film is disposed on at least a portion of sidewalls of the first via.
Public/Granted literature
- US20200066577A1 VIA CLEANING TO REDUCE RESISTANCE Public/Granted day:2020-02-27
Information query
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