Invention Grant
- Patent Title: Semiconductor memory device
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Application No.: US17119095Application Date: 2020-12-11
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Publication No.: US11557605B2Publication Date: 2023-01-17
- Inventor: Go Oike , Hanae Ishihara
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2018-001537 20180109
- Main IPC: H01L27/11582
- IPC: H01L27/11582 ; H01L27/1157 ; H01L27/11565 ; H01L27/11573 ; H01L27/11575

Abstract:
According to an embodiment, a semiconductor memory device includes a substrate, a stacked body, a plurality of first members, and at least one first insulating member. The stacked body is provided on the substrate and includes a plurality of electrode layers. The electrode layers are stacked apart from each other in a first direction and extend in a second direction parallel to an upper surface of the substrate. The first members are provided in the stacked body and extend in the first direction and the second direction. The first insulating member is provided in the stacked body and extends in the first direction and a third direction so that the electrode layers are divided into a plurality of regions in the second direction, the third direction intersecting with the second direction and being parallel to the upper surface of the substrate.
Public/Granted literature
- US20210098492A1 SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2021-04-01
Information query
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