Invention Grant
- Patent Title: Projector focusing method and projector focusing system capable of projecting high resolution images at arbitrary positions
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Application No.: US17469861Application Date: 2021-09-08
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Publication No.: US11558591B2Publication Date: 2023-01-17
- Inventor: Ta Hsien , Ming-Hung Kao , Meng-Che Tsai
- Applicant: WELTREND SEMICONDUCTOR INC.
- Applicant Address: TW Hsinchu
- Assignee: WELTREND SEMICONDUCTOR INC.
- Current Assignee: WELTREND SEMICONDUCTOR INC.
- Current Assignee Address: TW Hsinchu
- Agent Winston Hsu
- Priority: TW110102502 20210122
- Main IPC: H04N9/31
- IPC: H04N9/31 ; G03B21/53 ; G02B26/08

Abstract:
A projector focusing method includes acquiring a plane angle of a light beam and acquiring a first distance and a second distance between two sides of a light beam edge displayed on a projection plane and a time of flight device after the time of flight device emits the light beam to the projection plane, acquiring a plane equation of the projection plane according to the first distance and the second distance, acquiring an optical axis vector of a digital micro-mirror device (DMD) disposed inside the projector, designating target coordinates of the DMD, converting the target coordinates to the projection target coordinates on the projection plane according to the plane equation, acquiring an customized emitting vector according to the projection target coordinates and a lens position of the projector, and acquiring an ideal focal distances of the projector according to the customized emitting vector and the optical axis vector.
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