Invention Grant
- Patent Title: Charged particle treatment planning system with PBS beamlets sequence optimized for high dose deposition rate
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Application No.: US17362559Application Date: 2021-06-29
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Publication No.: US11559702B2Publication Date: 2023-01-24
- Inventor: Rudi Labarbe , Lucian Hotoiu , Arnaud Pin
- Applicant: Ion Beam Applications S.A.
- Applicant Address: BE Louvain-la-Neuve
- Assignee: Ion Beam Applications S.A.
- Current Assignee: Ion Beam Applications S.A.
- Current Assignee Address: BE Louvain-la-Neuve
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, LLP
- Priority: EP20183082 20200630,EP20194440 20200903
- Main IPC: A61N5/10
- IPC: A61N5/10

Abstract:
A treatment planning system for generating a plan for treatment by radiation with charged particles beams applied by pencil beam scanning onto a target tissue comprising tumoral cells is provided. The treatment planning system performs a dose definition stage defining the doses to be deposited within the peripheral surface, a beam definition stage defining positions and dimensions of the beamlets of the PBS during the at least one high rate fraction, the beams definition stage including a dose rate definition stage comprising at least one high rate fraction, and a beamlets scanning sequence stage defining a scanning sequence of irradiation of the beamlets. The beamlets scanning sequence stage optimizes a time sequence of beamlets emission such that at the end of a fraction j, a dose is deposited onto at least a predefined fraction of each specific volume at a mean deposition rate superior or equal to a predefined value.
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