Invention Grant
- Patent Title: Onium salt, chemically amplified resist composition, and patterning process
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Application No.: US16743295Application Date: 2020-01-15
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Publication No.: US11560355B2Publication Date: 2023-01-24
- Inventor: Masahiro Fukushima , Masaki Ohashi , Kazuhiro Katayama
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: WHDA, LLP
- Priority: JPJP2019-005024 20190116
- Main IPC: C07C381/12
- IPC: C07C381/12 ; G03F7/004 ; G03F7/039 ; C07D307/77 ; G03F7/32 ; G03F7/20 ; G03F7/038
Abstract:
A novel onium salt of formula (1) and a chemically amplified resist composition comprising the same as a PAG are provided. When processed by photolithography using KrF or ArF excimer laser, EB or EUV, the resist composition has a high sensitivity and reduced acid diffusion and is improved in exposure latitude, MEF, and LWR.
Public/Granted literature
- US20200223796A1 ONIUM SALT, CHEMICALLY AMPLIFIED RESIST COMPOSITION, AND PATTERNING PROCESS Public/Granted day:2020-07-16
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