Invention Grant
- Patent Title: Gold sputtering target and method for producing the same
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Application No.: US16893135Application Date: 2020-06-04
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Publication No.: US11560620B2Publication Date: 2023-01-24
- Inventor: Tetsuya Kato , Takashi Terui , Masahiro Takahashi
- Applicant: TANAKA KIKINZOKU KOGYO K. K.
- Applicant Address: JP Tokyo
- Assignee: TANAKA KIKINZOKU KOGYO K. K.
- Current Assignee: TANAKA KIKINZOKU KOGYO K. K.
- Current Assignee Address: JP Tokyo
- Agency: Orrick, Herrington & Sutcliffe LLP
- Agent Joseph A. Calvuruso; K. Patrick Herman
- Priority: JPJP2017-234720 20171206
- Main IPC: C23C14/34
- IPC: C23C14/34
Abstract:
A gold sputtering target has a gold purity of 99.999% or more. In such a gold sputtering target, an average value of Vickers hardness is 20 or more and less than 40, an average crystal grain size is 15 μm or more and 200 μm or less, and a {110} plane of gold is preferentially oriented to a surface to be sputtered of the gold sputtering target.
Public/Granted literature
- US20200340101A1 GOLD SPUTTERING TARGET AND METHOD FOR PRODUCING THE SAME Public/Granted day:2020-10-29
Information query
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