Invention Grant
- Patent Title: Slim vapor chamber
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Application No.: US16673212Application Date: 2019-11-04
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Publication No.: US11561050B2Publication Date: 2023-01-24
- Inventor: Shih-Lin Huang , Ting-Yuan Wu , Chiu-Kung Chen , Chun-Lung Chiu
- Applicant: DELTA ELECTRONICS, INC.
- Applicant Address: TW Taoyuan
- Assignee: DELTA ELECTRONICS, INC.
- Current Assignee: DELTA ELECTRONICS, INC.
- Current Assignee Address: TW Taoyuan
- Agency: Muncy, Geissler, Olds & Lowe, P.C.
- Priority: CN201610560393.0 20160715
- Main IPC: F28D15/04
- IPC: F28D15/04 ; F28F3/00 ; F28F13/06 ; F28D21/00

Abstract:
A slim vapor chamber includes a first plate, a second plate and a capillary structure. The periphery of the second plate is connected with that of the first plate to form a chamber. The capillary structure is disposed on an inner wall of the chamber. Both of a side of the first plate facing the second plate and a side of the second plate facing the first plate are formed with a plurality of supporting structures, which include a plurality of supporting pillars and a plurality of supporting plates, by an etching process.
Public/Granted literature
- US20200064080A1 SLIM VAPOR CHAMBER Public/Granted day:2020-02-27
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