Invention Grant
- Patent Title: Wafer chucking monitor using high frequency injected AC signal
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Application No.: US17143960Application Date: 2021-01-07
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Publication No.: US11562918B2Publication Date: 2023-01-24
- Inventor: Peter Match , Carlos Alicea
- Applicant: Advanced Energy Industries, Inc.
- Applicant Address: US CO Fort Collins
- Assignee: Advanced Energy Industries, Inc.
- Current Assignee: Advanced Energy Industries, Inc.
- Current Assignee Address: US CO Fort Collins
- Agency: Neugeboren O'Dowd PC
- Main IPC: H01T23/00
- IPC: H01T23/00 ; H01L21/67 ; H01L21/66 ; H01L21/683 ; H02N13/00

Abstract:
This disclosure describes systems, methods, and apparatus for non-invasive wafer chuck monitoring using a low voltage AC signal injected into a high voltage DC chucking voltage provided to a wafer chuck. Monitoring the injected signal can provide insight into the wafer chucking state and remedial actions, such as realignment of the wafer with the wafer chuck, can be carried out. Because of the low voltage nature of the AC signal, wafer chuck monitoring can be performed without influencing chucking performed by the higher voltage DC chucking voltage.
Public/Granted literature
- US20220216080A1 WAFER CHUCKING MONITOR USING HIGH FREQUENCY INJECTED AC SIGNAL Public/Granted day:2022-07-07
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