Invention Grant
- Patent Title: Speaker with dual resonance chambers
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Application No.: US16925177Application Date: 2020-07-09
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Publication No.: US11564029B2Publication Date: 2023-01-24
- Inventor: Kai Lin Shen , Sheng Hung Wang , Penhao Ma , Wei-Min Liang
- Applicant: Hewlett-Packard Development Company, L.P.
- Applicant Address: US TX Spring
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Spring
- Agency: Quarles & Brady LLP
- Main IPC: H04R1/10
- IPC: H04R1/10 ; H04R9/00

Abstract:
The inventive subject matter is directed to headset audio systems having resonance chambers designed to improve a system's frequency response in certain ranges. Systems of the inventive subject matter include a casing that both holds a speaker driver and creates two resonance chambers. Each resonance chamber vents to ambient air outside the casing, where the length and cross-sectional areas of each vent can impact the system's frequency response. Each resonance chamber is tuned to a resonant frequency to improve the system's frequency response across a range of frequencies on either side of each chamber's resonant frequency.
Public/Granted literature
- US20220014840A1 SPEAKER WITH DUAL RESONANCE CHAMBERS Public/Granted day:2022-01-13
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