Invention Grant
- Patent Title: Method for manufacturing high purity tin, electrowinning apparatus for high purity tin and high purity tin
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Application No.: US16674676Application Date: 2019-11-05
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Publication No.: US11572632B2Publication Date: 2023-02-07
- Inventor: Kouichi Takemoto , Toru Imori , Takashi Ouchi , Hirofumi Takahashi
- Applicant: JX Nippon Mining & Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Faegre Drinker Biddle & Reath LLP
- Main IPC: C25C1/14
- IPC: C25C1/14 ; C25C7/06 ; C22C13/00

Abstract:
Provided is a method for manufacturing high purity tin including: depositing electrodeposited tin on the surface of a cathode by electrowinning in an electrolytic bath in which a diaphragm is placed between an anode and the cathode, by using a raw material for tin as the anode and a leachate obtained by electrolytically leaching the raw material for tin in a sulfuric acid solution as an electrolytic solution, the electrolytic solution containing a smoothing agent for improving a surface property of the electrodeposited tin; discharging the electrolytic solution from the electrolytic bath such that lead in the discharged electrolytic solution is removed; and putting the electrolytic solution from which lead is removed back into the electrolytic bath.
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