Invention Grant
- Patent Title: Tin-plated copper terminal material and method of manufacturing the same
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Application No.: US17041088Application Date: 2019-03-29
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Publication No.: US11572633B2Publication Date: 2023-02-07
- Inventor: Fuyumi Mawatari , Kazunari Maki , Shinichi Funaki , Yuki Inoue , Kiyotaka Nakaya
- Applicant: MITSUBISHI MATERIALS CORPORATION
- Applicant Address: JP Tokyo
- Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee: MITSUBISHI MATERIALS CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Locke Lord LLP
- Agent James E. Armstrong, IV; Nicholas J. DiCeglie, Jr.
- Priority: JPJP2018-067620 20180330
- International Application: PCT/JP2019/014111 WO 20190329
- International Announcement: WO2019/189799 WO 20191003
- Main IPC: C25D5/00
- IPC: C25D5/00 ; B32B15/01 ; B32B15/20 ; C25D5/12 ; C25D5/50 ; C25D7/00 ; H01R13/03 ; H01R43/16

Abstract:
A tin-plated copper terminal material in which on a substrate made of copper or copper alloy, a nickel-or-nickel-alloy layer, a copper-tin alloy layer, and a tin layer are laminated in this order; in this material, the tin layer has an average thickness 0.2 μm to 1.2 μm inclusive; the copper-tin alloy layer is a compound alloy layer in which Cu6Sn5 is a main ingredient and part of copper in the Cu6Sn5 is substituted with nickel, and an average crystal grain size is 0.2 μm to 1.5 μm inclusive; part of the copper-tin alloy layer appears on a surface of the tin layer and tin solidification parts exist like islands; and the tin solidification parts have an average diameter 10 μm to 1000 μm inclusive in a direction along the surface of the tin layer and an area ratio to the surface of the tin layer 1% to 90% inclusive.
Public/Granted literature
- US20210108325A1 TIN-PLATED COPPER TERMINAL MATERIAL AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2021-04-15
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