Invention Grant
- Patent Title: Capacitive MEMS pressure sensor and method of manufacture
-
Application No.: US17180688Application Date: 2021-02-19
-
Publication No.: US11573145B2Publication Date: 2023-02-07
- Inventor: Jun Zheng
- Applicant: Rosemount Aerospace Inc.
- Applicant Address: US MN Burnsville
- Assignee: Rosemount Aerospace Inc.
- Current Assignee: Rosemount Aerospace Inc.
- Current Assignee Address: US MN Burnsville
- Agency: Kinney & Lange, P.A.
- Main IPC: G01L9/00
- IPC: G01L9/00 ; G01L9/12 ; B81B3/00

Abstract:
A method of fabricating a capacitive micromechanical electrical system (MEMS) pressure sensor includes the steps of forming a backing wafer, forming a diaphragm wafer that includes a diaphragm configured to deflect from an applied force and a pressure cavity configured to produce on the diaphragm the applied force which is indicative of a system pressure; fusing the diaphragm wafer to the backing wafer thereby forming a base wafer, forming a top wafer, joining the top wafer to the base wafer, thereby forming a detector wafer. The diaphragm defines a first capacitor surface and the top wafer defines a second capacitor surface. A void separates the second capacitor surface from the first capacitor surface by a separation distance which is a capacitor gap. A capacitive MEMS pressure sensor is also disclosed.
Public/Granted literature
- US20210302253A1 CAPACITIVE MEMS PRESSURE SENSOR AND METHOD OF MANUFACTURE Public/Granted day:2021-09-30
Information query