Invention Grant
- Patent Title: Method for producing a polarizing plate
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Application No.: US17329147Application Date: 2021-05-25
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Publication No.: US11573359B2Publication Date: 2023-02-07
- Inventor: Hiromu Mashima , Takamichi Inomata
- Applicant: ZEON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ZEON CORPORATION
- Current Assignee: ZEON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Kenja IP Law PC
- Priority: JP2017-143264 20170725
- Main IPC: G02B5/30
- IPC: G02B5/30 ; G02F1/1335 ; H01L51/52 ; B29D11/00

Abstract:
A method for producing a polarizing plate including a polarizer and a substrate film is provided. The method comprises: stretching a primary film to obtain a polarizer material film; providing an unstretched substrate film on the polarizer material film to obtain a layered body; and stretching the layered body to obtain the polarizing plate. The polarizer includes a dichroic material and has a thickness T of 20 μm or less. A phase difference Re in an in-plane direction of the substrate film in the polarizing plate is 20 nm or less.
Public/Granted literature
- US20210278580A1 METHOD FOR PRODUCING A POLARIZING PLATE Public/Granted day:2021-09-09
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