Invention Grant
- Patent Title: Photoresist composition
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Application No.: US16631765Application Date: 2018-07-24
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Publication No.: US11573492B2Publication Date: 2023-02-07
- Inventor: Hyun Min Park , Minyoung Lim , Tae Seob Lee
- Applicant: LG CHEM, LTD.
- Applicant Address: KR Seoul
- Assignee: LG CHEM, LTD.
- Current Assignee: LG CHEM, LTD.
- Current Assignee Address: KR Seoul
- Agency: Rothwell, Figg, Ernst & Manbeck. P.C.
- Priority: KR10-2017-0151809 20171114,KR10-2018-0085444 20180723
- International Application: PCT/KR2018/008366 WO 20180724
- International Announcement: WO2019/098493 WO 20190523
- Main IPC: G03F7/039
- IPC: G03F7/039 ; C08F20/38 ; G03F7/004 ; G03F7/20
Abstract:
The present invention relates to a chemically amplified photoresist composition including an alkali-soluble resin including a (meth)acrylate-based resin containing a (meth)acrylate-based repeating unit in which a heterocyclic compound is substituted via a divalent functional group containing an alkylene sulfide having 1 to 20 carbon atoms.
Public/Granted literature
- US20200218153A1 PHOTORESIST COMPOSITION Public/Granted day:2020-07-09
Information query
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