Invention Grant
- Patent Title: Resistive random access memory, and method for manufacturing resistive random access memory
-
Application No.: US17373957Application Date: 2021-07-13
-
Publication No.: US11574678B2Publication Date: 2023-02-07
- Inventor: Tetsuro Tamura
- Applicant: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITED
- Applicant Address: JP Yokohama
- Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITED
- Current Assignee: FUJITSU SEMICONDUCTOR MEMORY SOLUTION LIMITED
- Current Assignee Address: JP Yokohama
- Agency: WHDA, LLP
- Priority: JPJP2020-156059 20200917,JPJP2021-064697 20210406
- Main IPC: G11C11/00
- IPC: G11C11/00 ; G11C13/00 ; H01L45/00

Abstract:
A resistive random access memory includes a memory cell including a resistive element having a resistance which varies according to a write operation and stores data according to the resistance of the resistive element, a reference resistive element having a resistance set to a first value, a voltage line set to a first voltage during a first write operation in which the resistance of the resistive element is varied from a second value higher than the first value to the first value, and a voltage control circuit arranged between first ends of the two resistive elements. The voltage control circuit adjusts a value of the first voltage supplied from the voltage line so as to reduce a difference between currents flowing through the two resistive elements during the first write operation, and supply the adjusted first voltage to the first ends of the two resistive elements.
Public/Granted literature
- US20220084592A1 RESISTIVE RANDOM ACCESS MEMORY, AND METHOD FOR MANUFACTURING RESISTIVE RANDOM ACCESS MEMORY Public/Granted day:2022-03-17
Information query