Invention Grant
- Patent Title: Multiple-charged particle-beam irradiation apparatus and multiple-charged particle-beam irradiation method
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Application No.: US17448559Application Date: 2021-09-23
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Publication No.: US11574797B2Publication Date: 2023-02-07
- Inventor: Mitsuhiro Okazawa
- Applicant: NUFLARE TECHNOLOGY, INC.
- Applicant Address: JP Yokohama
- Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee: NUFLARE TECHNOLOGY, INC.
- Current Assignee Address: JP Yokohama
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2020-164005 20200929
- Main IPC: H01J37/317
- IPC: H01J37/317 ; H01J37/304 ; H01J37/04

Abstract:
A multiple-charged particle-beam irradiation apparatus includes a shaping aperture array substrate that causes a charged particle beam to pass through a plurality of first apertures to form multi-beams, a plurality of blanking aperture array substrates each provided with a plurality of second apertures, which enable corresponding beams to pass, and including a blanker arranged at each of the second apertures, a movable table on which the blanking aperture array substrates are mounted so as to be spaced apart from each other in a second direction, which is orthogonal to a first direction along an optical axis, and that moves in the second direction to position one of the blanking aperture array substrates on the optical axis, and an alignment mechanism that performs an alignment adjustment between the blanking aperture array substrate on the optical axis and the shaping aperture array substrate.
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