Invention Grant
- Patent Title: Computer storage medium to perform a substrate treatment method using a block copolymer containing a hydrophilic and hydrophobic copolymers
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Application No.: US16516344Application Date: 2019-07-19
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Publication No.: US11574812B2Publication Date: 2023-02-07
- Inventor: Makoto Muramatsu , Tadatoshi Tomita , Hisashi Genjima , Gen You , Takahiro Kitano
- Applicant: Tokyo Electron Limited
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2014-194167 20140924
- Main IPC: H01L21/027
- IPC: H01L21/027 ; H01L21/033 ; G03F7/00 ; G03F7/40 ; H01L21/31 ; H01L21/67 ; H05H1/46
Abstract:
A substrate treatment method of treating a substrate using a block copolymer containing a hydrophilic polymer and a hydrophobic polymer, includes: a resist pattern formation step of forming a predetermined resist pattern by a resist film on the substrate; a thin film formation step of forming a thin film for suppressing deformation of the resist pattern on a surface of the resist pattern; a block copolymer coating step of applying a block copolymer to the substrate after the formation of the thin film; and a polymer separation step of phase-separating the block copolymer into the hydrophilic polymer and the hydrophobic polymer.
Public/Granted literature
- US20190341255A1 SUBSTRATE TREATMENT METHOD, COMPUTER STORAGE MEDIUM AND SUBSTRATE TREATMENT SYSTEM Public/Granted day:2019-11-07
Information query
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