- Patent Title: Method and apparatus for substrate transfer and radical confinement
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Application No.: US17017624Application Date: 2020-09-10
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Publication No.: US11574831B2Publication Date: 2023-02-07
- Inventor: Jared Ahmad Lee , Martin Jeffrey Salinas , Paul B. Reuter , Imad Yousif , Aniruddha Pal
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Patterson & Sheridan, LLP
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L21/677 ; C23C16/455 ; C23C16/458 ; H01L21/687 ; H01L21/306 ; H01L21/683
Abstract:
Examples of the present invention provide an apparatus for transferring substrates and confining a processing environment in a chamber. One example provides a hoop assembly for use in a processing chamber. The hoop assembly includes a confinement ring defining a confinement region therein. A hoop body mates with the confinement ring. The hoop body is slanted to reduce a thickness across a diameter of the hoop body. Three or more lifting fingers are attached to the hoop body and extend downwards. Each of the three or more lifting fingers has a contact tip positioned radially inward from the hoop body to form a substrate support surface below and spaced apart from the confinement region.
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