Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17211035Application Date: 2021-03-24
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Publication No.: US11574994B2Publication Date: 2023-02-07
- Inventor: Masahiro Shimura , Mitsuhiro Noguchi
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, McClelland, Maier & Neustadt, L.L.P.
- Priority: JPJP2019-048013 20190315,JPJP2019-111760 20190617
- Main IPC: H01L49/02
- IPC: H01L49/02 ; H01L27/06 ; H01L23/522

Abstract:
A semiconductor device according to embodiments includes: a first conductivity-type first semiconductor layer set to a first potential; a second conductivity-type second semiconductor layer stacked on the first semiconductor layer and set to a second potential; an interlayer insulating film disposed on a main surface of the second semiconductor layer; a resistor disposed above the first semiconductor layer while interposing the second semiconductor layer and the interlayer insulating film therebetween; and a terminal electrically connected to the second semiconductor layer.
Public/Granted literature
- US20210210592A1 SEMICONDUCTOR DEVICE Public/Granted day:2021-07-08
Information query
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