Invention Grant
- Patent Title: Semiconductor device
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Application No.: US17329205Application Date: 2021-05-25
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Publication No.: US11574999B2Publication Date: 2023-02-07
- Inventor: Tohru Shirakawa , Yasunori Agata , Kaname Mitsuzuka
- Applicant: FUJI ELECTRIC CO., LTD.
- Applicant Address: JP Kanagawa
- Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee: FUJI ELECTRIC CO., LTD.
- Current Assignee Address: JP Kanagawa
- Priority: JPJP2020-119493 20200710
- Main IPC: H01L29/06
- IPC: H01L29/06 ; H01L29/739 ; H01L29/08

Abstract:
Provided is a semiconductor device comprising an active region and an edge region, the semiconductor device comprising: a drift region of a first conductivity type provided in the semiconductor substrate; a base region of a second conductivity type provided above the drift region; a first collector region of the second conductivity type provided below the drift region in the active region; and a second collector region of the second conductivity type provided below the drift region in the edge region, wherein a doping concentration of the first collector region is higher than a doping concentration of the second collector region, wherein an area of the first collector region is of the same size as an area of the second collector region or larger than the area of the second collector region, in a top plan view.
Public/Granted literature
- US20220013628A1 SEMICONDUCTOR DEVICE Public/Granted day:2022-01-13
Information query
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