- Patent Title: Heterojunction bipolar transistor and method for forming the same
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Application No.: US17501415Application Date: 2021-10-14
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Publication No.: US11575030B2Publication Date: 2023-02-07
- Inventor: She-Hsin Hsiao , Rong-Hao Syu , Shu-Hsiao Tsai
- Applicant: WIN SEMICONDUCTORS CORP.
- Applicant Address: TW Taoyuan
- Assignee: WIN SEMICONDUCTORS CORP.
- Current Assignee: WIN SEMICONDUCTORS CORP.
- Current Assignee Address: TW Taoyuan
- Agency: McClure, Qualey & Rodack, LLP
- Main IPC: H01L29/737
- IPC: H01L29/737 ; H01L29/08 ; H01L23/522

Abstract:
A heterojunction bipolar transistor includes an emitter layer on a base layer on a collector layer on an upper sub-collector layer over a bottom sub-collector layer, a first dielectric film over the bottom sub-collector layer, the base layer and the emitter layer, a base electrode on the first dielectric film, electrically connected to the base layer through at least one first via hole in the first dielectric film, a second dielectric film on the first dielectric film and the base electrode, and a conductive layer on the second dielectric film, with conductive layer electrically connected to base electrode through a second via hole disposed in the second dielectric film, first dielectric film between the base electrode and first sidewall of a stack including the base layer and the collector layer, and second via hole laterally separated from the base layer.
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