Invention Grant
- Patent Title: Solid-state imaging device, imaging apparatus, and method of manufacturing solid-state imaging device
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Application No.: US17028269Application Date: 2020-09-22
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Publication No.: US11575848B2Publication Date: 2023-02-07
- Inventor: Kenta Nojima , Kenju Nishikido
- Applicant: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Applicant Address: JP Kanagawa
- Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee: SONY SEMICONDUCTOR SOLUTIONS CORPORATION
- Current Assignee Address: JP Kanagawa
- Agency: Chip Law Group
- Priority: JP2016-179584 20160914
- Main IPC: H04N5/374
- IPC: H04N5/374 ; H01L27/146 ; H04N5/369

Abstract:
There is provided a solid-state imaging device including a semiconductor substrate on which photoelectric conversion devices are arranged in an imaging device region in a two-dimensional array, and a stacked body formed by stacking layers on the semiconductor substrate, wherein the stacked body includes an in-layer lens layer that has in-layer lenses each provided at a position corresponding to each of the photoelectric conversion devices, a planarization layer that is stacked on the in-layer lens layer and that has a generally planarized surface, and an on-chip lens layer that is an upper layer than the planarization layer and that has on-chip lenses each provided at a position corresponding to each of the photoelectric conversion devices, and the in-layer lens layer has structures at a height generally equal to a height of the in-layer lenses, the structures being provided on an outside of the imaging device region.
Public/Granted literature
- US20210006737A1 SOLID-STATE IMAGING DEVICE, IMAGING APPARATUS, AND METHOD OF MANUFACTURING SOLID-STATE IMAGING DEVICE Public/Granted day:2021-01-07
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