Invention Grant
- Patent Title: Method of forming a graphene device using polymer material as a support for a graphene film
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Application No.: US15557039Application Date: 2016-03-09
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Publication No.: US11577960B2Publication Date: 2023-02-14
- Inventor: Dipankar Kalita , Vincent Bouchiat , Laetitia Marty , Nedjma Bendiab
- Applicant: Centre National de la Recherche Scientifique , UNIVERSITE GRENOBLE ALPES
- Applicant Address: FR Paris; FR Saint Martin d'Heres
- Assignee: Centre National de la Recherche Scientifique,UNIVERSITE GRENOBLE ALPES
- Current Assignee: Centre National de la Recherche Scientifique,UNIVERSITE GRENOBLE ALPES
- Current Assignee Address: FR Paris; FR Saint Martin d'Heres
- Agency: Kaplan Breyer Schwarz, LLP
- Priority: FR1551931 20150309
- International Application: PCT/EP2016/054963 WO 20160309
- International Announcement: WO2016/142400 WO 20160915
- Main IPC: C01B32/186
- IPC: C01B32/186 ; G06F3/01 ; C01B32/194 ; B32B27/12 ; G06F3/042
Abstract:
The invention concerns a method of forming a graphene device, the method comprising: forming a graphene film (100) over a substrate; depositing, by gas phase deposition, a polymer material covering a surface of the graphene film (100); and removing the substrate from the graphene film (100), wherein the polymer material forms a support (102) for the graphene film (100).
Public/Granted literature
- US20180057361A1 METHOD OF FORMING A GRAPHENE DEVICE Public/Granted day:2018-03-01
Information query
