Invention Grant
- Patent Title: Wafer inspection apparatus and method
-
Application No.: US17116708Application Date: 2020-12-09
-
Publication No.: US11579096B2Publication Date: 2023-02-14
- Inventor: Sungha Kim , Hyounggon Kim , Doohyun Cho , Kwangsung Lee , Jongsu Kim , Taejoong Kim , Jeongsu Ha
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Agency: Sughrue Mion, PLLC
- Priority: KR10-2020-0052419 20200429
- Main IPC: G01N21/95
- IPC: G01N21/95 ; G01B11/06

Abstract:
A thickness estimating apparatus includes a transfer robot, a light source, a camera, a memory and a controller. The memory stores a thickness predicting model generated based on a data set including a thickness of at least one of a test wafer corresponding to the wafer or a test element layer formed on the test wafer, and the thickness predicting model being trained to minimize a loss function of the data set. The controller applies pixel data, which is acquired from at least one pixel selected from a plurality of pixels included in a captured image, to the thickness predicting model, to predict a thickness of at least one of the wafer or an element layer formed on the wafer in a position corresponding to a position of the selected pixel.
Public/Granted literature
- US20210341396A1 WAFER INSPECTION APPARATUS AND METHOD Public/Granted day:2021-11-04
Information query