Invention Grant
- Patent Title: Projection system and projector
-
Application No.: US17155232Application Date: 2021-01-22
-
Publication No.: US11579424B2Publication Date: 2023-02-14
- Inventor: Eiji Morikuni
- Applicant: SEIKO EPSON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: SEIKO EPSON CORPORATION
- Current Assignee: SEIKO EPSON CORPORATION
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2020-008955 20200123
- Main IPC: G03B21/28
- IPC: G03B21/28 ; G02B17/08 ; G02B13/00

Abstract:
A projection system includes a first and second optical system including an optical element. The optical element has a first transmissive surface, a reflection surface, and a second transmissive surface. The second transmissive surface has a convex shape an aspheric shape. An effective light ray range of the second transmissive surface has a first end close to an optical axis of the reflection surface in a first axis direction along a first axis perpendicular to the optical axis and a second end far from the optical axis. A first radius of curvature at the first end is greater than a second radius of curvature at the second end, and a first center of curvature of the first radius of curvature is farther than a second center of curvature of the second radius of curvature from the first end.
Public/Granted literature
- US20210231932A1 PROJECTION SYSTEM AND PROJECTOR Public/Granted day:2021-07-29
Information query