Invention Grant
- Patent Title: Dresser, polishing device, and method of dressing polishing pad
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Application No.: US16557429Application Date: 2019-08-30
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Publication No.: US11583975B2Publication Date: 2023-02-21
- Inventor: Tomonori Kawasaki
- Applicant: Kioxia Corporation
- Applicant Address: JP Tokyo
- Assignee: Kioxia Corporation
- Current Assignee: Kioxia Corporation
- Current Assignee Address: JP Tokyo
- Agency: Foley & Lardner LLP
- Priority: JPJP2019-042934 20190308
- Main IPC: B24B53/00
- IPC: B24B53/00 ; B24B53/017 ; B24B53/12 ; B24B37/00

Abstract:
A dresser includes a main body having a stepped surface comprising a plurality of steps, wherein a thickness of the main body at a first step of the plurality of steps is a largest thickness of the main body, and a thickness of the main body at a last step of the plurality of steps is a smallest thickness of the main body; and a plurality of superhard particles disposed on each of the plurality of steps of the stepped surface. The plurality of steps of the stepped surface are different in area, and particle diameters of the superhard particles increase stepwise from the first step of the plurality of steps to the last step of the plurality of steps.
Public/Granted literature
- US20200282513A1 DRESSER, POLISHING DEVICE, AND METHOD OF DRESSING POLISHING PAD Public/Granted day:2020-09-10
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