Invention Grant
- Patent Title: Wire saw apparatus and method for manufacturing wafer
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Application No.: US16957787Application Date: 2018-11-01
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Publication No.: US11584037B2Publication Date: 2023-02-21
- Inventor: Kazutoshi Mizushima , Toshiaki Otaka , Tatsuo Enomoto , Yuichi Shimizu
- Applicant: SHIN-ETSU HANDOTAI CO., LTD.
- Applicant Address: JP Tokyo
- Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee: SHIN-ETSU HANDOTAI CO., LTD.
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JPJP2017-247854 20171225
- International Application: PCT/JP2018/040633 WO 20181101
- International Announcement: WO2019/130806 WO 20190704
- Main IPC: B28D5/04
- IPC: B28D5/04 ; B24B27/06

Abstract:
A wire saw apparatus including: a plurality of wire guides; a wire row formed of a wire which is wound around the plurality of wire guides and configured to reciprocatively travel in an axial direction; a nozzle configured to supply a coolant or slurry to the wire; a workpiece-holding portion configured to suspend and hold a workpiece plate having a workpiece bonded thereto with a beam interposed therebetween; a workpiece-feeding mechanism configured to press the workpiece against the wire row; and a mechanism configured to adjust a parallelism of axes of the plurality of wire guides around which the wire row is formed. Thereby, a wire saw apparatus and a method for manufacturing a wafer are provided which enable manufacturing of a wafer having any warp shape by controlling a warp in a wire travelling direction of a sliced workpiece.
Public/Granted literature
- US20210362373A1 WIRE SAW APPARATUS AND METHOD FOR MANUFACTURING WAFER Public/Granted day:2021-11-25
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