Invention Grant
- Patent Title: Fluid handling device and fluid handling method
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Application No.: US17533260Application Date: 2021-11-23
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Publication No.: US11585448B2Publication Date: 2023-02-21
- Inventor: Koichi Ono , Nobuya Sunaga
- Applicant: Enplas Corporation
- Applicant Address: JP Saitama
- Assignee: Enplas Corporation
- Current Assignee: Enplas Corporation
- Current Assignee Address: JP Saitama
- Agency: Brundidge & Stanger, P.C.
- Priority: JPJP2016-155851 20160808,JPJP2017-056601 20170322
- Main IPC: F16K7/16
- IPC: F16K7/16 ; B01J19/00 ; B01L3/00 ; F16K99/00 ; G01N37/00

Abstract:
A fluid handling device, comprising: a substrate including a first channel, a second channel and a partition wall formed between the first channel and the second channel; a film including a diaphragm, the film being disposed on the substrate so that the diaphragm faces the partition wall; and a sliding member slidable on the film while contacting with the film, the sliding member including a protrusion formed on an underside thereof, and the sliding member being disposed on the film with the underside facing the film, wherein: the sliding member is capable of switching between a first state and a second state by sliding on the film, wherein the protrusion is positioned so as not to face the partition wall with the diaphragm therebetween in the first state, and the protrusion is positioned so as to face the partition wall with the diaphragm therebetween in the second state.
Public/Granted literature
- US20220082170A1 FLUID HANDLING DEVICE AND FLUID HANDLING METHOD Public/Granted day:2022-03-17
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