Invention Grant
- Patent Title: Chemically-amplified-type negative-type photoresist composition
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Application No.: US16098706Application Date: 2017-04-26
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Publication No.: US11586109B2Publication Date: 2023-02-21
- Inventor: Seung Hun Lee , Seung Hyun Lee , Su Jin Lee , Young Cheol Choi
- Applicant: YOUNG CHANG CHEMICAL CO., LTD
- Applicant Address: KR Gyeongsangbuk-do
- Assignee: YOUNG CHANG CHEMICAL CO., LTD
- Current Assignee: YOUNG CHANG CHEMICAL CO., LTD
- Current Assignee Address: KR Gyeongsangbuk-do
- Agency: Novick, Kim & Lee PLLC
- Agent Jae Youn Kim
- Priority: KR10-2016-0058744 20160513
- International Application: PCT/KR2017/004451 WO 20170426
- International Announcement: WO2017/196010 WO 20171116
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/004 ; G03F7/30
Abstract:
The present invention relates to a chemically-amplified-type negative photoresist composition, and more particularly to a chemically-amplified-type negative photoresist composition suitable for use in a semiconductor process, which includes a specific organic acid additive, thereby improving a processing margin in a short-wavelength exposure light source compared to conventional negative photoresists.
Public/Granted literature
- US20190137871A1 CHEMICALLY-AMPLIFIED-TYPE NEGATIVE-TYPE PHOTORESIST COMPOSITION Public/Granted day:2019-05-09
Information query
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