Invention Grant
- Patent Title: Method of operating semiconductor apparatus
-
Application No.: US17411571Application Date: 2021-08-25
-
Publication No.: US11586115B2Publication Date: 2023-02-21
- Inventor: Shih-Ming Chang , Chiu-Hsiang Chen , Ru-Gun Liu
- Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Applicant Address: TW Hsinchu
- Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Main IPC: G03F7/20
- IPC: G03F7/20

Abstract:
A method of operating a semiconductor apparatus includes generating an electric field in peripheral areas of a first covering structure and a second covering structure; causing a photomask to move to a position between the first and second covering structures such that the photomask at least partially vertically overlaps the first and second covering structures and such that particles attached to the photomask are attracted to the first and second covering structures by the electric field; and irradiating the photomask with light through light transmission regions of the first and second covering structures.
Public/Granted literature
- US20210382399A1 METHOD OF OPERATING SEMICONDUCTOR APPARATUS Public/Granted day:2021-12-09
Information query
IPC分类: