Invention Grant
- Patent Title: Systems and methods for automatic concentration control
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Application No.: US16932012Application Date: 2020-07-17
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Publication No.: US11586230B2Publication Date: 2023-02-21
- Inventor: Cheng-Hao Kuo , Chia-Lun Chen , Chung-Hao Hu
- Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
- Applicant Address: TW Hsinchu
- Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
- Current Assignee Address: TW Hsinchu
- Agency: Seed IP Law Group LLP
- Main IPC: G05D11/13
- IPC: G05D11/13 ; H01L21/67 ; G05D7/06

Abstract:
Semiconductor processing systems and methods are provided in which an amount or concentration of a chemical in a chemical mixture contained in a tank is automatically controlled based on a sensed properties of the chemical mixture. In some embodiments, a semiconductor processing system includes a processing tank that is configured to contain a chemical mixture. A chemical sensor is configured to sense one or more properties of the chemical mixture. The system further includes an electrically controllable valve that is configured to adjust an amount of the first chemical in the chemical mixture based on the sensed one or more properties of the chemical mixture.
Public/Granted literature
- US20210200250A1 SYSTEMS AND METHODS FOR AUTOMATIC CONCENTRATION CONTROL Public/Granted day:2021-07-01
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