Invention Grant
- Patent Title: Pattern recognition system, parameter generation method, and parameter generation program
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Application No.: US17044425Application Date: 2018-05-10
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Publication No.: US11586850B2Publication Date: 2023-02-21
- Inventor: Katsuhiko Takahashi , Hiroyoshi Miyano , Tetsuo Inoshita
- Applicant: NEC Corporation
- Applicant Address: JP Tokyo
- Assignee: NEC Corporation
- Current Assignee: NEC Corporation
- Current Assignee Address: JP Tokyo
- International Application: PCT/JP2018/018104 WO 20180510
- International Announcement: WO2019/215868 WO 20191114
- Main IPC: G06K9/62
- IPC: G06K9/62 ; G06V10/75

Abstract:
The first parameter generation unit 811 generates a first parameter, which is a parameter of a first recognizer, using first learning data including a combination of data to be recognized, a correct label of the data, and domain information indicating a collection environment of the data. The second parameter generation unit 812 generates a second parameter, which is a parameter of a second recognizer, using second learning data including a combination of data to be recognized that is collected in a predetermined collection environment, a correct label of the data, and target domain information indicating the predetermined collection environment, based on the first parameter. The third parameter generation unit 813 integrates the first parameter and the second parameter to generate a third parameter to be used for pattern recognition of input data by learning using the first learning data.
Public/Granted literature
- US20210027110A1 PATTERN RECOGNITION SYSTEM, PARAMETER GENERATION METHOD, AND PARAMETER GENERATION PROGRAM Public/Granted day:2021-01-28
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