Invention Grant
- Patent Title: Pattern inspection system
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Application No.: US17410344Application Date: 2021-08-24
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Publication No.: US11587225B2Publication Date: 2023-02-21
- Inventor: Shuyang Dou , Shinichi Shinoda , Yasutaka Toyoda , Hiroyuki Shindo
- Applicant: Hitachi High-Tech Corporation
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Tech Corporation
- Current Assignee: Hitachi High-Tech Corporation
- Current Assignee Address: JP Tokyo
- Agency: Volpe Koenig
- Priority: JPJP2018-162607 20180831
- Main IPC: G06T7/00
- IPC: G06T7/00 ; G06T7/73 ; G06T7/13 ; G06T7/80 ; G06N20/00 ; G06T7/11

Abstract:
A pattern inspection system inspects an image of an inspection target pattern of an electronic device using an identifier constituted by machine learning, based on the image of the inspection target pattern of the electronic device and data used to manufacture the inspection target pattern. The system includes a storage unit which stores a plurality of pattern images of the electronic device and pattern data used to manufacture a pattern of the electronic device, and an image selection unit which selects a learning pattern image used in the machine learning from the plurality of pattern images, based on the pattern data and the pattern image stored in the storage unit.
Public/Granted literature
- US20210383524A1 PATTERN INSPECTION SYSTEM Public/Granted day:2021-12-09
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