Invention Grant
- Patent Title: Temperature control device for chemical liquid used in semiconductor manufacturing process
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Application No.: US17098249Application Date: 2020-11-13
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Publication No.: US11587806B2Publication Date: 2023-02-21
- Inventor: Min Cheol Bang
- Applicant: Min Cheol Bang
- Applicant Address: KR Hwaseong-si
- Assignee: Min Cheol Bang
- Current Assignee: Min Cheol Bang
- Current Assignee Address: KR Hwaseong-si
- Agency: Lex IP Meister, PLLC
- Priority: KR10-2019-0146443 20191115
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01L35/02

Abstract:
The present invention relates to a temperature control device for a chemical liquid used in a semiconductor manufacturing process, which is located on a chemical liquid circulating and supplying tube to control a temperature of the chemical liquid. The device includes: a first heat sink having a cooling water flow path formed therein; a plurality of thermoelectric modules coming into contact with both side surfaces of the first heat sink, respectively; and a second heat sink coming into contact with the thermoelectric modules, while placing the first heat sink between the thermoelectric modules, and having a plurality of chemical liquid flow path tubes adapted to flow the chemical liquid therealong.
Public/Granted literature
- US20210151337A1 TEMPERATURE CONTROL DEVICE FOR CHEMICAL LIQUID USED IN SEMICONDUCTOR MANUFACTURING PROCESS Public/Granted day:2021-05-20
Information query
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