- Patent Title: Thin film transistor including crystallized semiconductor, display device including the same, manufacturing method of the same, and method for crystallizing semiconductor
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Application No.: US17146736Application Date: 2021-01-12
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Publication No.: US11587952B2Publication Date: 2023-02-21
- Inventor: Youngbin Do , Chae Yeon Hwang
- Applicant: ADRC. CO. KR
- Applicant Address: KR Seoul
- Assignee: ADRC. CO. KR
- Current Assignee: ADRC. CO. KR
- Current Assignee Address: KR Seoul
- Agency: Lex IP Meister, PLLC
- Priority: KR10-2020-0026137 20200302
- Main IPC: H01L27/12
- IPC: H01L27/12 ; H01L29/786 ; H01L21/02 ; H01L29/66 ; G02F1/1343 ; H01L27/15 ; H01L27/32 ; G02F1/1368

Abstract:
A thin film transistor according to an exemplary embodiment includes: a substrate; a semiconductor layer disposed on the substrate and including a channel region, and an input region and an output region disposed on both sides of the channel region and doped with an impurity; a buffer layer disposed between the substrate and the semiconductor layer; a control electrode overlapping the semiconductor layer; a gate insulation layer disposed between the semiconductor layer and the control electrode; and an input electrode connected to the input region and an output electrode connected to the output region, wherein the semiconductor layer includes polysilicon and is crystallized by a blue laser scan.
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