Invention Grant
- Patent Title: Silicon doped metal oxide particles, and composition for UV absorption comprising silicon doped metal oxide particles
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Application No.: US16485746Application Date: 2017-02-14
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Publication No.: US11591239B2Publication Date: 2023-02-28
- Inventor: Masakazu Enomura , Daisuke Honda
- Applicant: M. TECHNIQUE CO., LTD.
- Applicant Address: JP Izumi
- Assignee: M. TECHNIQUE CO., LTD.
- Current Assignee: M. TECHNIQUE CO., LTD.
- Current Assignee Address: JP Izumi
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- International Application: PCT/JP2017/005389 WO 20170214
- International Announcement: WO2018/150477 WO 20180823
- Main IPC: C09D5/32
- IPC: C09D5/32 ; C09D17/00 ; C01G9/02 ; C01G49/00 ; C01G49/02 ; C01F17/00 ; C01F17/235

Abstract:
The object of the present invention is to provide silicon doped metal oxide particles for UV absorption, which average molar absorption coefficient in the wavelength range of 200 nm to 380 nm, is enhanced. Provided is silicon doped metal oxide particles in which the metal oxide particles are doped with silicon, wherein an average molar absorption coefficient in the wavelength range of 200 nm to 380 nm, of a dispersion in which the silicon doped metal oxide particles are dispersed in a dispersion medium, is improved as compared with similar metal oxide particles not doped with silicon.
Information query
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