Invention Grant
- Patent Title: Vat resin with additives for thiourethane polymer stereolithography printing
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Application No.: US17723966Application Date: 2022-04-19
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Publication No.: US11591485B2Publication Date: 2023-02-28
- Inventor: Gregory T. Ellson , Benjamin R. Lund , Walter Voit
- Applicant: Board of Regents, The University of Texas System , Adaptive 3D Technologies
- Applicant Address: US TX Austin; US TX Dallas
- Assignee: Board of Regents, The University of Texas System,Adaptive 3D Technologies
- Current Assignee: Board of Regents, The University of Texas System,Adaptive 3D Technologies
- Current Assignee Address: US TX Austin; US TX Dallas
- Main IPC: B29C64/124
- IPC: B29C64/124 ; C09D11/101 ; C09D11/102 ; C09D11/033 ; C08G18/38 ; C08G18/08 ; B33Y10/00 ; B33Y70/00 ; C08G18/73 ; C08G18/76 ; C08G18/72 ; C08G18/75 ; C08G18/79 ; C08G18/20 ; B29K75/00

Abstract:
A method of three-dimensional stereolithography printing a thiourethane polymer part using the vat resin. Adding a resin to a vat of a three-dimensional stereolithography printer, the resin a liquid mixture including: a first type of monomer including two or more thiol functional groups, a second type of monomer including two or more isocyanate functional groups, a photolatent base, an anionic step-growth polymerization reaction inhibitor and a light absorber. The photolatent base is decomposable upon exposure to a light to form a non-nucleophillic base catalyst having a pKa greater than 7. The anionic step-growth polymerization reaction inhibitor has an acidic group configured to form an acid-base pair with the non-nucleophillic base. The light absorber has an absorbance in the liquid mixture that is greater than an absorbance of the photolatent base at a wavelength of the light used for the exposure.
Public/Granted literature
- US20220243078A1 VAT RESIN WITH ADDITIVES FOR THIOURETHANE POLYMER STEREOLITHOGRAPHY PRINTING Public/Granted day:2022-08-04
Information query
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