Invention Grant
- Patent Title: Sputtering target, granular film and perpendicular magnetic recording medium
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Application No.: US16973074Application Date: 2019-05-23
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Publication No.: US11591688B2Publication Date: 2023-02-28
- Inventor: Masayoshi Shimizu , Manami Masuda , Yasuyuki Iwabuchi , Takashi Kosho
- Applicant: JX Nippon Mining & Metals Corporation
- Applicant Address: JP Tokyo
- Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee: JX Nippon Mining & Metals Corporation
- Current Assignee Address: JP Tokyo
- Agency: Marshall, Gerstein & Borun LLP
- Priority: JPJP2018-150677 20180809
- International Application: PCT/JP2019/020554 WO 20190523
- International Announcement: WO2020/031459 WO 20200213
- Main IPC: H01J37/34
- IPC: H01J37/34 ; C23C14/34 ; G11B5/733 ; G11B5/84
Abstract:
Provided is a sputtering target containing 0.05 at % or more of Bi, and having a total content of metal oxides of from 10 vol % to 70 vol %, the balance containing at least Ru.
Public/Granted literature
- US20210246543A1 SPUTTERING TARGET, GRANULAR FILM AND PERPENDICULAR MAGNETIC RECORDING MEDIUM Public/Granted day:2021-08-12
Information query
