- Patent Title: Methods for electrolytically depositing pretreatment compositions
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Application No.: US16566010Application Date: 2019-09-10
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Publication No.: US11591707B2Publication Date: 2023-02-28
- Inventor: Gordon L. Post , Michael A. Mayo , Edward F. Rakiewicz , Michael J. Pawlik
- Applicant: PRC-DeSoto International, Inc.
- Applicant Address: US CA Sylmar
- Assignee: PRC-DeSoto International, Inc.
- Current Assignee: PRC-DeSoto International, Inc.
- Current Assignee Address: US CA Sylmar
- Agent Alicia M. Passerin; Ashley N. Crane
- Main IPC: C23C22/00
- IPC: C23C22/00 ; C23C22/48 ; C23C28/00 ; C23C28/02 ; C25D5/18 ; C25D11/00 ; C25D5/34 ; C25D9/08 ; C25D9/10 ; C25D9/12

Abstract:
Methods for treating a substrate are disclosed. The substrate is deoxidized and then immersed in an electrodepositable pretreatment composition comprising a lanthanide series element and/or a Group IIIB metal, an oxidizing agent, and a metal-complexing agent to deposit a coating from the electrodepositable pretreatment composition onto a surface of the substrate. Optionally, the electrodepositable pretreatment composition may comprise a surfactant. A coating from a spontaneously depositable pretreatment composition comprising a Group IIIB and/or Group IVB metal may be deposited on the substrate surface prior to electrodepositing a coating from the electrodepositable pretreatment composition. Following electrodeposition of the electrodepositable pretreatment composition, the substrate optionally may be contacted with a sealing composition comprising phosphate and a Group IIIB and/or IVB metal. Substrates treated according to the methods also are disclosed.
Public/Granted literature
- US20200002832A1 METHODS FOR ELECTROLYTICALLY DEPOSITING PRETREATMENT COMPOSITIONS Public/Granted day:2020-01-02
Information query
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