Invention Grant
- Patent Title: Ultra-hard carbon film from epitaxial two-layer graphene
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Application No.: US16757306Application Date: 2018-10-22
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Publication No.: US11591716B2Publication Date: 2023-02-28
- Inventor: Yang Gao , Tengfei Cao , Filippo Cellini , Elisa Riedo , Angelo Bongiorno
- Applicant: RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK , NEW YORK UNIVERSITY
- Applicant Address: US NY New York; US NY New York
- Assignee: RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK,NEW YORK UNIVERSITY
- Current Assignee: RESEARCH FOUNDATION OF THE CITY UNIVERSITY OF NEW YORK,NEW YORK UNIVERSITY
- Current Assignee Address: US NY New York; US NY New York
- Agency: Foley & Lardner LLP
- International Application: PCT/US2018/056896 WO 20181022
- International Announcement: WO2019/079800 WO 20190425
- Main IPC: C30B33/00
- IPC: C30B33/00 ; C01B32/194 ; A41D31/24 ; A42B3/04 ; C30B23/02 ; C30B29/02 ; F41H5/04
Abstract:
An ultra-hard carbon film is formed by the uniaxial compression of thin films of graphene. The graphene films are two or three layers thick (2-L or 3-L). High pressure compression forms a diamond-like film and provides improved properties to the coated substrates.
Public/Granted literature
- US20210404091A1 ULTRA-HARD CARBON FILM FROM EPITAXIAL TWO-LAYER GRAPHENE Public/Granted day:2021-12-30
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