- Patent Title: System, method and computer program product for object examination
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Application No.: US17129745Application Date: 2020-12-21
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Publication No.: US11592400B2Publication Date: 2023-02-28
- Inventor: Saar Shabtay , Moshe Amzaleg , Zvi Goren
- Applicant: Applied Materials Israel Ltd.
- Applicant Address: IL Rehovot
- Assignee: Applied Materials Israel Ltd.
- Current Assignee: Applied Materials Israel Ltd.
- Current Assignee Address: IL Rehovot
- Agency: Lowenstein Sandler LLP
- Main IPC: G01N21/88
- IPC: G01N21/88 ; G06T7/00 ; G01N21/95 ; G01N21/84

Abstract:
Inspection data that corresponds to potential defects of an object may be received. A first set of locations of first potential defects can be identified. The first set of locations of the first potential defects can be imaged with a review tool to obtain a first set of review images. The first potential defects can be classified based on the first set of review images to obtain first classification results of the first potential defects. An instruction can be determined for the review tool based on the first classification results, the instruction being associated with detecting potential defects. Using the instruction, a second set of locations of second potential defects of the plurality of potential defects to be imaged with the review tool can be identified.
Public/Granted literature
- US20210109029A1 SYSTEM, METHOD AND COMPUTER PROGRAM PRODUCT FOR OBJECT EXAMINATION Public/Granted day:2021-04-15
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