Invention Grant
- Patent Title: Method and system of reducing charged particle beam write time
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Application No.: US17135400Application Date: 2020-12-28
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Publication No.: US11592802B2Publication Date: 2023-02-28
- Inventor: Akira Fujimura , Harold Robert Zable , Nagesh Shirali , William E. Guthrie , Ryan Pearman
- Applicant: D2S, Inc.
- Applicant Address: US CA San Jose
- Assignee: D2S, Inc.
- Current Assignee: D2S, Inc.
- Current Assignee Address: US CA San Jose
- Agency: MLO, a professional corp.
- Main IPC: G05B19/4099
- IPC: G05B19/4099
Abstract:
A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. A backscatter is calculated for the area of the pattern based on the exposure information. An artificial background dose is determined for the area. The artificial background dose comprises additional exposure information and is combined with the original set of exposure information creating a modified set of exposure information. A system for exposing a pattern in an area on a surface using a charged particle beam lithography is also disclosed.
Public/Granted literature
- US20210116884A1 METHOD AND SYSTEM OF REDUCING CHARGED PARTICLE BEAM WRITE TIME Public/Granted day:2021-04-22
Information query
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