Invention Grant
- Patent Title: Resistive random-access memory
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Application No.: US17136733Application Date: 2020-12-29
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Publication No.: US11594676B2Publication Date: 2023-02-28
- Inventor: Kangguo Cheng , Choonghyun Lee , Juntao Li , Peng Xu
- Applicant: International Business Machines Corporation
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Amin, Turocy & Watson, LLP
- Main IPC: H01L45/00
- IPC: H01L45/00 ; H01L27/24

Abstract:
Techniques for fabricating a volatile memory structure having a transistor and a memory component is described. The volatile memory structure comprises the memory component formed on a substrate, wherein a first shape comprising one or more pointed edges is formed on a first surface of the memory component. The volatile memory structure further comprises transistor formed on the substrate and electrically coupled to the memory component to share operating voltage, wherein operating voltage applied to the transistor flows to the memory component.
Public/Granted literature
- US20210151670A1 RESISTIVE RANDOM-ACCESS MEMORY Public/Granted day:2021-05-20
Information query
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