The invention relates to a disinfection process comprising the feed materials H2O2 and NO2− and a mixing step and a distribution step, wherein the mixing step and the distribution step (during which each point on the surface being disinfected is wetted with a solution of active substance) are implemented during a processing period ZA. An exposure step follows, in which the distributed solution of active substance acts upon the surface in contact with the solution of active substance during an exposure period ZE. In this process, the maximum NO2− concentration during the mixing step is of 300 mM, and the time-integrated reaction rate W is represented during the exposure period ZE by the integral formula (I), where k1 denotes the pH-value-dependent speed constant of the reaction between H2O2 and NO2− and the pH value of the solution of active substance before it contacts the surface being disinfected lies in the range of 2.1≤pH≤6.8. The invention also relates to a device for providing the solution of active substance.