Invention Grant
- Patent Title: Wafer producing method and laser processing apparatus
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Application No.: US17650735Application Date: 2022-02-11
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Publication No.: US11597039B2Publication Date: 2023-03-07
- Inventor: Ryohei Yamamoto , Kazuya Hirata
- Applicant: DISCO CORPORATION
- Applicant Address: JP Toyo
- Assignee: DISCO CORPORATION
- Current Assignee: DISCO CORPORATION
- Current Assignee Address: JP Toyo
- Agency: Greer Burns & Crain Ltd.
- Priority: JPJP2018-172314 20180914
- Main IPC: B23K26/364
- IPC: B23K26/364 ; B28D5/00 ; B24B1/00 ; B23K26/08 ; H01L21/02 ; H01L21/67 ; B23K103/00

Abstract:
A wafer producing apparatus detects a facet area from an upper surface of an SiC ingot, sets X and Y coordinates of plural points lying on a boundary between the facet area and a nonfacet area in an XY plane, and sets a focal point of a laser beam having a transmission wavelength to SiC inside the SiC ingot at a predetermined depth from the upper surface of the SiC ingot. The predetermined depth corresponds to the thickness of the SiC wafer to be produced. A control unit increases the energy of the laser beam and raises a position of the focal point in applying the laser beam to the facet area as compared with the energy of the laser beam and a position of the focal point in applying the laser beam to the nonfacet area, according to the X and Y coordinates.
Public/Granted literature
- US20220161367A1 WAFER PRODUCING METHOD AND LASER PROCESSING APPARATUS Public/Granted day:2022-05-26
Information query
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